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• ASML,EUV 광원; 반도체 병목;DUV; Sn,tin droplet evaporation;triple pulse; * wafer 도달시의 해상도: DUV resolution= 40 nm; EUV resolution= 20 nm; *> alternative: multiple patterning 500 k@ --> 1.5 kW 상용화 성공; * high NA(numerical) EUV; Anamorphic lens optics; scan rate; reticle stage blog.naver.com · 2026.06.12